| 摘要 |
Use of a compound of formula (I) and the pharmaceutically acceptable acid addition salts thereof, wherein R1 is either halogen or hydrogen and R2 is halogen; X is CH2, O or S; R3 and R4 are the same or different and selected from hydrogen or lower alkyl; n is 2 or 3; A is selected from the pyrimidyl- or pyridyl-groups (a), (b) or (c) wherein R5, R6 and R7 are as defined in the description; for the manufacture of a medicament for the relief or prevention of a withdrawal syndrome resulting from addiction to a drug or substance of abuse or for treatment thereof.
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