| 摘要 |
An improved nitrogen blanket distributor is provided for use in an atmospheric pressure chemical vapor deposition (CVD) apparatus of the type used for semiconductor fabrication. In the improved distributor, the nitrogen plenums are formed using angular components replacing the tubular components known in the art, thus considerably stiffening the distributor structure. Improved multi-layer lateral seals are also provided for preventing gas flow around the distributor assembly. Furthermore, improved stress relieving features are provided in the primary screen in order to reduce thermal cycling failures of that component.
|
