| 摘要 |
In an exposure apparatus for projecting a mask pattern of a mask onto a photosensitive substrate, provided are a substrate stage which is two-dimensionally movable along an upper surface of a substrate base while carrying the photosensitive substrate thereon; substrate stage cable-relaying means which is disposed so as to be physically separated from the substrate base surface, secures thereto a cable connected to the substrate stage, and is movable in the same two-dimensional directions as those of the substrate stage; and substrate stage driving means to control an amount of movement of the substrate stage cable-relaying means such that relative positions of the substrate stage and cable-relaying means with respect to each other are always kept constant. Further, a reticle stage is similarly provided with reticle stage cable-relaying means which two-dimensionally moves so as to follow the reticle stage.
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