发明名称 Method of post CMP defect stability improvement
摘要 The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substrate surface, by delivering a spray of one or more rinse agents to the surface and, preferably, causing the rinse agent to flow across the surface from a central region to an outer region where unwanted debris and material is collected.
申请公布号 US6220941(B1) 申请公布日期 2001.04.24
申请号 US19980164860 申请日期 1998.10.01
申请人 APPLIED MATERIALS, INC. 发明人 FISHKIN BORIS;GARRETSON CHARLES C.;MCKEEVER PETER;OSTERHELD THOMAS H.;PRABHU GOPALAKRISHNA B.;BENNETT DOYLE E.;BONNER BENJAMIN A.;HUEY SIDNEY
分类号 B24B37/04;B24B53/007;B24B57/02;(IPC1-7):B24B1/00 主分类号 B24B37/04
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