| 摘要 |
Metrology for ultrathin dielectric layers of the order of less than 10 nanometers in thickness is achieved by specular ellipsometry in a totally controlled ambient between the light source and the detector, in which, a precise 2.75 through 9.0 eV photon energy range continuum of light is employed. In the signal analysis there is the taking into consideration the effect of noise in the development of the ellipsometric parameter values and in the resulting data. In the invention the precise photon energy range operates to sharpen the identifiability of the change parameters imparted into the reflected light in the ellipsometry while minimizing absorption and signal definiteness masking; and the taking into consideration of noise in the signal analysis involves providing a simulated noise spectrum for comparison with the least squares fitting algorithm-derived parameters to determine the quality of the minimum and the reliability of the inferred parameters.
|
