发明名称 |
FORMATION METHOD AND FORMATION APPARATUS FOR THIN FILM |
摘要 |
PROBLEM TO BE SOLVED: To form an organic thin film with even thickness. SOLUTION: A transportation mechanism 180 moves a heater 110 in a prescribed direction. The heater 110 holds and heats a glass substrate 1, which is an object to be coated with an organic solution 2. A die 130 supplies an organic solution on the glass substrate 1 heated at a prescribed temperature. A sensor 130b measures a distance between the glass substrate 1 and the die 130. A controller 190 control a transportation mechanism 180 corresponding to the measurement result of the sensor 130b and moves the heater 110 at a prescribed speed while keeping the distance between the glass substrate 1 and the die 130 to apply the organic solution 2 to the glass substrate 1 and to form an organic thin film on the substrate.
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申请公布号 |
JP2001113214(A) |
申请公布日期 |
2001.04.24 |
申请号 |
JP19990297394 |
申请日期 |
1999.10.19 |
申请人 |
CASIO COMPUT CO LTD |
发明人 |
IIHAMA TOMOMI;SHIRASAKI TOMOYUKI;KANEKO NORIHIKO |
分类号 |
B05D1/26;B05C5/02;B05C9/10;B05C13/00;B05D7/00;H01L51/50;H05B33/10;H05B33/12;H05B33/14;(IPC1-7):B05C5/02 |
主分类号 |
B05D1/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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