| 摘要 |
PURPOSE:To obtain the exposure device which is difficult to receive the influence of defects, dust, dirt, etc. by using optical systems such as holograms, lasers, beam expanders and making use of the redundancy of holography. CONSTITUTION:The light out from a laser 27 is expanded of its luminous flux by a beam expander 28 and radiates a hologram 29. The real image 31 of patterns is reconstructed on a water 30 and the patterns are formed on the wafer. The hologram 29 has redundancy and therefore even if there are defects such as flaws and chips on a number of places on the hologram or even if dust and dirt deposit thereon, the influcence of such defects does not appear on the reconstructed image 31. By using optical systems such as holograms, lasers, beam expanders and making positive use of the redundancy of the hologram in this way, the apparatus may be made difficult to receive the influence of defects, dust, dirt, etc. |
