LARGE-SCALE, LOW PRESSURE PLASMA-ION DEPOSITION OF DIAMONDLIKE CARBON FILMS

摘要

Diamondlike carbon is deposited on a deposition substrate (46) in a deposition apparatus (40) that can be evacuated and backfilled with a carbonaceous gas. A plasma (68) is generated in the gas by heating a filamen t (62) within the chamber (42) to produce electrons, and positively biasing th e filament (62) with respect to the deposition chamber wall (44) to accelerate the electrons into the carbonaceous gas. The carbonaceous gas dissociates and ionizes in the resulting plasma (68) to produce positively charged carbon ions. The deposition substrate (46) within the chamber (42) is negatively biased with respect to the deposition chamber wall (44), accelerating the carbon ions so that they are deposited onto the surface of the substrate (46).