| 摘要 |
<p>PURPOSE: To reduce the scattering of connection strength between an external connection cable and a transparent conduction film formed on both surfaces of an electrooptical crystal. CONSTITUTION: A first metal film 14 made of chromium having a specified area is formed on a voltage impressing part on a transparent conduction film 12 formed on both surfaces of an electrooptical crystal 1. And a second metal film 15 is formed on the surface of the first metal film 14 with gold, copper or platinum. On the second metal film 15, external wires 13 having a plane on the surfaces contacting to the second metal film 15 is soldered. By this, the scattering of connection strength between the transparent conduction films and external connection cables is reduced and the scattering of detection accuracy is thus reduced.</p> |
