| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist material that makes good use of the rectilinear propagation of electrons as a characteristic of an electron beam at a high accelerating voltage and attains high throughput while retaining high pattern line width controlling capability. SOLUTION: The sensitivity of a resist decreases until the accelerating voltage of an electron beam becomes about 50 kV but the sensitivity rises again at >50 kV and increases suddenly. When an electron beam at about 100 kV is used, a minute pattern is formed and throughput is raised. |
