MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT

摘要

PROBLEM TO BE SOLVED: To offer the manufacture of semiconductor elements, especially of solar cells, which can form desired electrode patterns by simple processes at a low cost. SOLUTION: An electrode pattern is formed by such method that, after p-type semiconductor layers 3 and 4 are formed on a silicon substrate 1 and an n-type semiconductor layer 5 is formed on the p-type semiconductor layer, the n-type semiconductor layer is removed with a predetermined pattern by using laser abrasion so as to expose the p-type semiconductor layer.