发明名称 MECHANISM FOR PREVENTING FALLING OF SUBSTRATE AND SUBSTRATE INSPECTION DEVICE EQUIPPED THEREWITH
摘要 <p>PROBLEM TO BE SOLVED: To provide a mechanism for preventing falling of substrate which can prevent a substrate from falling off even when the substrate is defectively vacuum-chucked and a substrate inspection device provided with the mechanism. SOLUTION: This mechanism is provided with a locking member-moving means which retracts a locking member 24 from the front side of the surface of a substrate W when the substrate W is horizontally arranged with its rear surface R faced downward and, in addition, sets up the member 24 by facing the member 24 to the surface and peripheral edge of the substrate W when the substrate W is inclined from the horizontal state. Accordingly, the member 24 retreates and does not obstruct visual inspections, etc., when the substrate W is in the horizontal state and, in addition, can prevent a falling and slipping down of the substrate W even when the substrate W comes off due to defective chuck by vacuum even when the substrate W is inclined, because the locking member is faced to the surface and peripheral edge of the substrate W.</p>
申请公布号 JP2001110882(A) 申请公布日期 2001.04.20
申请号 JP19990288745 申请日期 1999.10.08
申请人 NIKON CORP 发明人 KOMATSU MANABU
分类号 B25J15/06;B65G49/07;G01R1/04;G01R31/28;H01L21/66;H01L21/683;H01L21/687;(IPC1-7):H01L21/68 主分类号 B25J15/06
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