| 摘要 |
PROBLEM TO BE SOLVED: To obtain a new photosensitive resin composition having high sensitivity and excellent in developability and residual film properties. SOLUTION: In a photosensitive resin composition containing a photosensitive material and a resin, two or more resins having a refractive index difference of >=0.03 are used so as to enhance the sensitivity of the composition by utilizing a light scattering phenomenon in the composition. The two or more resins having a refractive index difference of >=0.03 may be a combination of a novolak resin and a polymethacrylate such as polymethyl methacrylate. |
