METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR TREATMENT APPARATUS,申请号JP20000236304-传众专利搜索

发明名称	METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR TREATMENT APPARATUS
摘要	PROBLEM TO BE SOLVED: To provide a manufacturing apparatus (system) for obtaining a highly clean process for manufacturing an semiconductor element, such as a semiconductor integrated circuit, etc. SOLUTION: A multi-chamber system, having a plurality of vacuum devices (film forming apparatus, etching apparatus, heat-treatment apparatus, spare chamber, etc.), used for manufacturing a semiconductor element is characterized in that at least one of the vacuum devices is a laser beam irradiation apparatus.
申请公布号	JP2001110741(A)	申请公布日期	2001.04.20
申请号	JP20000236304	申请日期	2000.08.04
申请人	SEMICONDUCTOR ENERGY LAB CO LTD	发明人	YAMAZAKI SHUNPEI;TAKEUCHI AKIRA;TAKEMURA YASUHIKO
分类号	H01L21/302;H01L21/02;H01L21/20;H01L21/205;H01L21/265;H01L21/268;H01L21/3065;H01L21/336;H01L21/677;H01L21/68;H01L29/786;(IPC1-7):H01L21/268	主分类号	H01L21/302
代理机构		代理人
主权项
地址