发明名称 SILICON OXIDATION METHOD
摘要 electronics, namely micro- and nanoelectronics, possibly manufacture of integrated circuits with quantum-size heteroepitaxial structures on insulated substrates. SUBSTANCE: method is based upon anode polarization of silicon in electrolyte solutions and it is realized at using as oxidizers electrolyte solutions in light homofunctional ketones. EFFECT: enlarged assortment of electronic articles due to using quantum-size semiconductor structures non-suitable for heat treatment, enhanced electrical insulation in silicon-on-insulator structures due to creation of high-quality hidden oxide layers, possibility for making pliable insulated silicon substrates for heteroepitaxial growing of semiconductive materials. 3 dwg, 3 ex
申请公布号 RU2165481(C2) 申请公布日期 2001.04.20
申请号 RU19990110763 申请日期 1999.05.25
申请人 IJA RAN;JAKOVLEV JURIJ IGOREVICH;ROMANOV SERGEJ IVANOVICH 发明人 JAKOVLEV JU.I.;ROMANOV S.I.;KIRIENKO V.V.
分类号 C25B1/00;C01B33/12 主分类号 C25B1/00
代理机构 代理人
主权项
地址