发明名称 |
SEMICONDUCTOR MEMORY ELEMENT COMPRISING CAPACITOR PROTECTIVE FILM AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor memory element comprising a capacitor protective film and a low-resistance contact material film which prevent degradation of a capacitor dielectric film due to impurity diffusion. SOLUTION: The entire surface of a capacitor contained in a semiconductor memory element is covered with an encapsulating layer comprising multiple films. The encapsulating layer comprises at least a blocking layer and a capacitor protection layer made from different materials. The semiconductor memory element may comprise a hydrogen infiltration preventive film which is another capacitor protective film between a passivation film and a capacitor. |
申请公布号 |
JP2001111007(A) |
申请公布日期 |
2001.04.20 |
申请号 |
JP20000270446 |
申请日期 |
2000.09.06 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
RI YOTAKU;CHO HAG-JU;KIN EIKAN |
分类号 |
H01L21/8247;H01L21/02;H01L21/316;H01L21/318;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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