发明名称 SEMICONDUCTOR MEMORY ELEMENT COMPRISING CAPACITOR PROTECTIVE FILM AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor memory element comprising a capacitor protective film and a low-resistance contact material film which prevent degradation of a capacitor dielectric film due to impurity diffusion. SOLUTION: The entire surface of a capacitor contained in a semiconductor memory element is covered with an encapsulating layer comprising multiple films. The encapsulating layer comprises at least a blocking layer and a capacitor protection layer made from different materials. The semiconductor memory element may comprise a hydrogen infiltration preventive film which is another capacitor protective film between a passivation film and a capacitor.
申请公布号 JP2001111007(A) 申请公布日期 2001.04.20
申请号 JP20000270446 申请日期 2000.09.06
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 RI YOTAKU;CHO HAG-JU;KIN EIKAN
分类号 H01L21/8247;H01L21/02;H01L21/316;H01L21/318;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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