| 摘要 |
PROBLEM TO BE SOLVED: To eliminate an unnecessary coating film formed in a peripheral part with high precision by using a simple constitution. SOLUTION: This coating film eliminating equipment consists of a spin chuck 9 which holds and rotates a substrate W on the surface on which a coating film is formed, a rinse liquid nozzle 4 which jets rinse liquid against the surface of the substrate W for selectively eliminating the coating film on a position against which the rinse liquid is jetted, a position detecting mechanism 3 which is arranged to face an outer edge of the substrate W and detects the position of the outer edge of the substrate W, an alignment mechanism 11 which holds the spin chuck 9 and drives the substrate W relatively to the rinse liquid nozzle 4, and a control part 15 which controls the alignment mechanism 11 on the basis of detected results of the position detecting mechanism 3 and positions the substrate W and the rinse liquid nozzle 4 relatively. |
