发明名称 METHOD FOR MANUFACTURING POLYCRYSTALLINE SILICON THIN FILM
摘要 PROBLEM TO BE SOLVED: To realize sufficient crystal growth, and obtain a crystal whose grain diameter is large by obtaining a proper cooling speed, after heating and melting an amorphous silicon thin film. SOLUTION: Hearing or lamp-hearing an annealing chamber after laser heating and melting of an amorphous silicon thin film are carried out, and the cooling speed is made proper. Thus, a crystal whose grain diameter is large can be manufactured.
申请公布号 JP2001110723(A) 申请公布日期 2001.04.20
申请号 JP19990282737 申请日期 1999.10.04
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TAKEGAWA HIROZO
分类号 H01L21/20;(IPC1-7):H01L21/20 主分类号 H01L21/20
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