REMOVING SOLUTION FOR PHOTOPOLYMERIZABLE PHOTOSENSITIVE MATERIAL AND RIB PATTERN FORMING METHOD USING SAME

摘要

PROBLEM TO BE SOLVED: To obtain a removing solution for a photopolymerizable photosensitive material capable of thoroughly dissolving and removing the photopolymerizable photosensitive material used in the production of PDP and capable of forming a high precision rib pattern and to provide a rib pattern forming method using the removing solution. SOLUTION: The removing solution for a photopolymerizable photosensitive material contains (a) an organic amine, (b) a quaternary ammonium salt and (c) water.