| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive type photosensitive composition having enhanced solubility of a half-exposed part to a developing solution, ensuring high discrimination, having high sensitivity and high resolving power and excellent also in the shape of pattern profile. SOLUTION: The positive type photosensitive composition contains (A) a compound which generates an acid when irradiated with active light or radiation, (B) a resin which is decomposed by the action of the acid to increase its solubility in an alkali developing solution and (C) a compound which is decomposed by the action of an alkali to increase its solubility in the alkali developing solution and has a molecular weight of <=3,000 or a compound which is decomposed by the action of an alkali to increase its affinity for the alkali developing solution. The compound C is preferably a compound of formula I (where R1-R5 may be the same or different and are each H, linear, branched or cyclic alkyl, halogen, hydroxyl or linear, branched or cyclic alkoxy and m+n>=1). |
