发明名称 |
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To reduce a dislocation defect and joint leak of a non-volatile memory where a stripe-like element separation region is formed for higher integration, for raised reliability and yield. SOLUTION: An AND type flush memory is formed on a substrate where a stripe-like element separation region 5 is formed while an active region L sandwiched between element separation regions 5 is formed in stripe as well. Here, a silicon single crystal substrate comprising nitrogen or carbon is used as a semiconductor substrate.
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申请公布号 |
JP2001111011(A) |
申请公布日期 |
2001.04.20 |
申请号 |
JP19990285953 |
申请日期 |
1999.10.06 |
申请人 |
HITACHI LTD |
发明人 |
NISHIMOTO TOSHIAKI;AOYANAGI TAKASHI;KIYOTA SHOGO |
分类号 |
G11C16/04;H01L21/322;H01L21/76;H01L21/762;H01L21/8234;H01L21/8247;H01L27/115;H01L29/78;H01L29/788;H01L29/792;(IPC1-7):H01L27/115;H01L21/824 |
主分类号 |
G11C16/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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