发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To reduce a dislocation defect and joint leak of a non-volatile memory where a stripe-like element separation region is formed for higher integration, for raised reliability and yield. SOLUTION: An AND type flush memory is formed on a substrate where a stripe-like element separation region 5 is formed while an active region L sandwiched between element separation regions 5 is formed in stripe as well. Here, a silicon single crystal substrate comprising nitrogen or carbon is used as a semiconductor substrate.
申请公布号 JP2001111011(A) 申请公布日期 2001.04.20
申请号 JP19990285953 申请日期 1999.10.06
申请人 HITACHI LTD 发明人 NISHIMOTO TOSHIAKI;AOYANAGI TAKASHI;KIYOTA SHOGO
分类号 G11C16/04;H01L21/322;H01L21/76;H01L21/762;H01L21/8234;H01L21/8247;H01L27/115;H01L29/78;H01L29/788;H01L29/792;(IPC1-7):H01L27/115;H01L21/824 主分类号 G11C16/04
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