POSITIVE TYPE PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To obtain a positive type photoresist composition excellent in coating properties, capable of forming a uniform photoresist film and useful particularly in the production of LCDs and LSIs because the occurrence of marks of dropping and radial unevenness (striation) is prevented. SOLUTION: A surfactant containing a specified nonionic surfactant and a fluorine-containing surfactant is incorporated into a basic composition comprising an alkali-soluble novolak type resin and a quinonediazido-containing compound to obtain the objective positive type photoresist composition.