METHOD AND APPARATUS FOR LIGHT IRRADIATION TREATMENT

摘要

PROBLEM TO BE SOLVED: To realize highly efficient annealing treatment and activation treatment by light irradiation, without generating bending or deformation of a TFT glass substrate. SOLUTION: ATFT substrate 5 is arranged in a first light irradiating region 2 under a metal halide lamp 1 and a second light irradiating region 4 under a halogen lamp 3, so that light irradiation can be carried out by relatively moving scanning of the light irradiating regions and the TFT substrate. The selective heating of polysilicon under the metal halide lamp combines heating of the whole TFT substrate under the halogen lamp, so that the mismatching of cooling gradient or bimetal effect of the substrate and a thin film can be removed, and bending or deformation of the substrate can be prevented.