发明名称 CHARGED PARTICLE BEAM APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus that can suppress deterioration of fluorescent surface of a secondary electron detector. SOLUTION: A control means 26 controls a bias supply 25 so that the bias voltage becomes 100 (V) because a probe current of 1 (μA) is indicated. As a result, the potential V2 of a second electrode 20 becomes -100 (V). Among the secondary electrons that pass through a first electrode 19, those with energy ES>100 eV pass through the second electrode 20. The number of the secondary electrons that pass through the second electrode 20 is sufficient to obtain the secondary electron image, and the damage received by the fluorescent face 4 is small even though such number of secondary electrons are incident thereon. Accordingly, the fluorescent face scarcely deteriorates.
申请公布号 JP2001110350(A) 申请公布日期 2001.04.20
申请号 JP19990282315 申请日期 1999.10.04
申请人 JEOL LTD 发明人 YAMADA TAKAHISA
分类号 H01J37/244;H01J37/252;H01J37/28;(IPC1-7):H01J37/244 主分类号 H01J37/244
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