| 摘要 |
PROBLEM TO BE SOLVED: To prevent deterioration of organic layers of EL elements which is caused, when the EL elements are provided with patterning process, by the use of a cathode separator comprising photo-resists, as the cathode separator is left unremoved in the finished product and is moisture absorptive. SOLUTION: Etching process for the organic layer 55 is achieved in plasma containing oxygen. Especially even by adopting photo-resist PR as the etching mask, the photo-resist PR is removed at plasma etching, therefore moisture absorption by the photo-resist PR can be neglected.
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