发明名称 MANUFACTURING METHOD OF PHOTOELECTRIC CONVERSION DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To offer a method of manufacturing a high-quality photoelectric conversion device stably and precisely by executing laser scrubbing of some kinds of thin films formed on a substrate with good workability and a higher variance. SOLUTION: Splitting of a first electrode layer is executed by using one of a fundamental harmonic, a second higher harmonic and a third higher harmonic of a YAG laser. Opening of an opening for junction of semiconductor layers is executed by using the second or the third higher harmonic. Splitting of a second electrode layer is executed by using the second or the third higher harmonic. A first electrode layer of a marginal part of a substrate, the semiconductor layer, and the second electrode layer are removed partially by using the second or third higher harmonic of the YAG laser. At least, one of processes for the layers is executed by using the third higher harmonic of the YAG laser.</p>
申请公布号 JP2001111079(A) 申请公布日期 2001.04.20
申请号 JP19990291229 申请日期 1999.10.13
申请人 KANEGAFUCHI CHEM IND CO LTD 发明人 YAMAGISHI HIDEO
分类号 B23K26/00;H01L21/301;H01L31/04;(IPC1-7):H01L31/04 主分类号 B23K26/00
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