MASK DEFLECTION CORRECTION MECHANISM FOR BASE PLATE EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To easily correct the deflection of a mask which is large-sized due to gravity with respect to a mask deflection correction mechanism in a base plate exposure device. SOLUTION: Relating to the base plate exposure device that is provided with an exposure chuck 1 to hold a glass base plate 3 on an upper surface and a mask holder 4 to hold a mask 2 by which a pattern is transferred from the upper side of the glass base plate 3 on the upper surface and by which the pattern is formed on the glass base plate 3 by irradiating with light from the upper side of the mask 2 while leaving a prescribed small space between the mask 2 and the glass base plate 3, the mask holder 4 is constituted of two holder members 5a and 5b opposed so as to hold only both two sides opposed of the mask 2, and is provided with mask pressing parts 7a and 7b to correct the deflection of the mask 2 by pressing the edge parts of both two sides of the mask 2 held by the mask holder 4 from the upper side. Thus, the deflection of the mask 2 that is large-sized due to the gravity is easily corrected.