发明名称 SEMICONDUCTOR WAFER WITH ANISOTROPIC CONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR
摘要 <p>PROBLEM TO BE SOLVED: To provide a joined body of an anisotropic conductive film and a semiconductor wafer as a body of structure which suppresses warp ages. SOLUTION: An anisotropic conductive film 1 is bonded on a circuit surface 3a of a semiconductor wafer 3, and a suppressor layer 2 for suppressing the warpage of the whole semiconductor wafer, which may be caused by a heat expansion of the anisotropic conductive film 1 is bonded on a rear surface 3b of the semiconductor wafer 3. The suppressor layer 2 is provided for suppressing the warpage of the whole semiconductor wafer by resisting expanding and contracting force of the anisotropic conductive film 1 caused by the change in temperature. The suppressor layer itself generates expanding and contracting force corresponding to the change in temperature.</p>
申请公布号 JP2001110477(A) 申请公布日期 2001.04.20
申请号 JP19990285150 申请日期 1999.10.06
申请人 NITTO DENKO CORP 发明人 YAMAGUCHI YOSHIO;HOTTA YUJI;ASAI FUMITERU
分类号 H01R11/01;H01B5/16;H01L21/60;H01L21/683;H01L23/12;H01R43/00;(IPC1-7):H01R11/01 主分类号 H01R11/01
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