发明名称 |
SEMICONDUCTOR WAFER WITH ANISOTROPIC CONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a joined body of an anisotropic conductive film and a semiconductor wafer as a body of structure which suppresses warp ages. SOLUTION: An anisotropic conductive film 1 is bonded on a circuit surface 3a of a semiconductor wafer 3, and a suppressor layer 2 for suppressing the warpage of the whole semiconductor wafer, which may be caused by a heat expansion of the anisotropic conductive film 1 is bonded on a rear surface 3b of the semiconductor wafer 3. The suppressor layer 2 is provided for suppressing the warpage of the whole semiconductor wafer by resisting expanding and contracting force of the anisotropic conductive film 1 caused by the change in temperature. The suppressor layer itself generates expanding and contracting force corresponding to the change in temperature.</p> |
申请公布号 |
JP2001110477(A) |
申请公布日期 |
2001.04.20 |
申请号 |
JP19990285150 |
申请日期 |
1999.10.06 |
申请人 |
NITTO DENKO CORP |
发明人 |
YAMAGUCHI YOSHIO;HOTTA YUJI;ASAI FUMITERU |
分类号 |
H01R11/01;H01B5/16;H01L21/60;H01L21/683;H01L23/12;H01R43/00;(IPC1-7):H01R11/01 |
主分类号 |
H01R11/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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