发明名称 INTERFEROMETRIC RESIDUAL-STRESS ANALYSIS
摘要 <p>Interferometric residual-stress analysis measures residual stress using a phase-shifting electronic speckle pattern interferometer and a coherent light source. By using a single frequency laser, the need for path length matching of earlier configurations is eliminated and allows the use of fiber optics to make the system more compact. Furthermore, phase-shifting of the laser allows quantitative interferometric analysis to be used to determine displacement. In addition, a computer-implemented residual stress analysis sub-system having a display provides residual stress information to a user.</p>
申请公布号 WO2001027583(A1) 申请公布日期 2001.04.19
申请号 US2000028528 申请日期 2000.10.13
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址