发明名称 UNIVERSAL SEMICONDUCTOR WAFER FOR HIGH-VOLTAGE SEMICONDUCTOR COMPONENTS
摘要 A universal semiconductor wafer for high-voltage semiconductor components includes at least one layer of a first conductivity type which is provided on a semiconductor substrate of the first conductivity type. A plurality of floating semiconductor zones of a second, opposite conductivity type are embedded in the interface region between the semiconductor substrate and the at least one layer. The floating semiconductor zones are dimensioned such that the dimension of a semiconductor zone is do small compared to the layer thickness of the at least one semiconductor layer and is essentially equal to or less than a distance between the floating semiconductor zones in the interface region.
申请公布号 EP1092238(A1) 申请公布日期 2001.04.18
申请号 EP19990915461 申请日期 1999.02.08
申请人 INFINEON TECHNOLOGIES AG 发明人 TIHANYI, JENOE;PLOSS, REINHARD
分类号 H01L29/744;H01L21/18;H01L21/205;H01L21/22;H01L21/261;H01L21/265;H01L21/329;H01L21/331;H01L21/336;H01L29/06;H01L29/167;H01L29/40;H01L29/739;H01L29/78;H01L29/861;(IPC1-7):H01L29/06 主分类号 H01L29/744
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