| 摘要 |
The present invention provides a mask for measuring an optical aberration, the mask including at least a measuring pattern comprising plural pattern parts being separated from each other, wherein the plural pattern parts provide individual widths which are simply increased on first and second directional axes non-parallel to each other and vertical to a plane of the mask, provided that the width of each of the plural pattern parts is unchanged at least on the first and second directional axes. |
