| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for removing a reaction product adhering to a reaction tube, capable of safely carrying out a reaction product removing operation even when phosphorus is used for a gas for chemical vapor deposition. SOLUTION: A reaction product 5 adheres to a reaction tube 2 with the progress of chemical vapor deposition applied to a substrate by introducing phosphorus-containing gas into the reaction tube 2 and carrying out thermal decomposition and thermal synthesis. In the method for removing the above reaction product 5, oxygen having a prescribed pressure capable of blowing off the reaction product 5 is supplied into the reaction tube 2. Successively, the oxygen is heated and activated and allowed to react with the phosphorus in the reaction product 5 to carry out complete combustion. Then the reaction tube 2 is immersed in an etching solution to remove the reaction product 5 by etching.
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