发明名称 |
PLASMA TREATMENT APPARATUS AND METHOD OF CHANGING WORK-RETAINER IN PLASMA TREATMENT APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus wherein setup change work can easily be carried out, and a work-pressing member in the plasma treatment apparatus. SOLUTION: In a method for changing a substrate-pressing member wherein a substrate-pressing unit 22 detachably attached to an inside of a lid member 10 forming a treatment chamber and capable of being brought into contact with the substrate on an electrode to press the same to the electrode and a substrate-pressing pin 24 are changed at the time of setup change, the substrate- pressing unit 22 and the substrate-pressing pin 24 constituting the pressing unit 20 are integrally attached to and removed from the lid member 10 in the state of being attached and held to a sheet of top plate 21. By this method, position adjustment work of the pressing-member can be performed in a good work performance state so that setup change work can be facilitated, and apparatus stop time for setup change work can be shortened.
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申请公布号 |
JP2001104775(A) |
申请公布日期 |
2001.04.17 |
申请号 |
JP19990289556 |
申请日期 |
1999.10.12 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
IWAI TETSUHIRO;NAGATOME RYUJI |
分类号 |
H01L21/302;B01J19/08;C23C14/50;C23C16/458;H01L21/205;H01L21/3065;(IPC1-7):B01J19/08 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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