发明名称 PLASMA TREATMENT APPARATUS AND METHOD OF CHANGING WORK-RETAINER IN PLASMA TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus wherein setup change work can easily be carried out, and a work-pressing member in the plasma treatment apparatus. SOLUTION: In a method for changing a substrate-pressing member wherein a substrate-pressing unit 22 detachably attached to an inside of a lid member 10 forming a treatment chamber and capable of being brought into contact with the substrate on an electrode to press the same to the electrode and a substrate-pressing pin 24 are changed at the time of setup change, the substrate- pressing unit 22 and the substrate-pressing pin 24 constituting the pressing unit 20 are integrally attached to and removed from the lid member 10 in the state of being attached and held to a sheet of top plate 21. By this method, position adjustment work of the pressing-member can be performed in a good work performance state so that setup change work can be facilitated, and apparatus stop time for setup change work can be shortened.
申请公布号 JP2001104775(A) 申请公布日期 2001.04.17
申请号 JP19990289556 申请日期 1999.10.12
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 IWAI TETSUHIRO;NAGATOME RYUJI
分类号 H01L21/302;B01J19/08;C23C14/50;C23C16/458;H01L21/205;H01L21/3065;(IPC1-7):B01J19/08 主分类号 H01L21/302
代理机构 代理人
主权项
地址