| 摘要 |
In a method for determining the life of a laser light source for use with an exposure apparatus using KrF or ArF excimer laser as a light source for exposure, the method for determining the life of the laser light source is implemented by subjecting an excimer laser light source to single oscillation by blocking a pulse light, acquiring data relating to plural parameters for learning a periodical variation of the excimer laser light source and its structuring parts through an interface, and determining the life of the excimer laser light source on the basis of the data acquired. Those data is acquired on a regular basis in accompany with the work for exchanging gases at the time of exchanging gases for the excimer laser light source.
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