发明名称 COPPER CHLORIDE ETCHING SOLUTION ELECTROLYTIC REGENERATION SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To provide an improvement type electrolytic regeneration treating system capable of safely treating the problem of gaseous chlorine without increasing the running cost. SOLUTION: The solution return path from an electrolytic cell 2 to an etching cell 1 is arranged with a regeneration solution cell 3 having a circulating path provided with an ejector 31, gaseous chlorine separated by a gas-liquid separating means 28 fitted to the electrolytic cell is sucked by pressure reducing action by the ejector, moreover, an etching solution introduced from the etching cell is brought into gas-liquid contact with the gaseous chlorine, furthermore, an exhaust gas cleaning means for removing the gaseous chlorine components in the gas retained in the upper spaces of the electrolytic cell and the regeneration solution cell respectively having sealed structure is provided, and, in the exhaust gas cleaning means, the etching solution is brought into contact with the suction gas, and the removal of the gaseous chlorine components is executed.</p>
申请公布号 JP2001107271(A) 申请公布日期 2001.04.17
申请号 JP19990280012 申请日期 1999.09.30
申请人 NITTETSU MINING CO LTD 发明人 IORIZAKI MASAAKI;ORIGASA MINORU;TAKAYAMA SUSUMU
分类号 C23F1/46;C25C1/12;(IPC1-7):C23F1/46 主分类号 C23F1/46
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