CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND PRODUCTION OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a cleaning agent improved so that it may not cause disconnection of wirings or buried conductive layers. SOLUTION: This agent contains a hydroxide, water, and at least either of the compounds represented by formulae I and II: HO-((EO)x-(PO)y)z-H (I) and R-[((EO)x-(PO)y)z-H]m (II). In the formulae, EO is an oxyalkylene group; PO is an oxypropylene group; and x and y are integers satisfying x/(x+y)=0.05-0.4; and z is a positive integer; R is a residue derived by removing at least one hydroxyl group or aminic hydrogen atom from an alcohol or an amine; and m is an integer of 1 or greater. Desirably, the hydroxide is selected from tetramethylammonium hydroxide, potassium hydroxide, and sodium hydroxide.