PHOTOSENSITIVE RESIN, RESIST COMPOSITION USING PHOTOSENSITIVE RESIN, METHOD OF PATTERN FORMATION USING RESIST COMPOSITION, DEVICE PRODUCED BY METHOD THEREOF AND METHOD OF EXPOSURE USING RESIST HAVING PHOTOSENSITIVE RESIN

摘要

PROBLEM TO BE SOLVED: To obtain a photosensitive resin excellent in solubility in solvents and dry etching resistance which allows to easily produce a highly integrated semiconductor device. SOLUTION: This photosensitive resin has at least three kinds of parts containing an alicyclic group part and a sulfonyl part in a main chain. Besides, The photosensitive resin preferably has a vinyl monomer part in the main chain and the vinyl monomer part preferably has the alicyclic group in a side chain.