| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and method of transferring a wafer, using a ring boat having a wafer hold plate to avoid causing a nonuniform distribution of the temp. or stress in a wafer when it is heat-treated in a vertical furnace. SOLUTION: Using a ring boat 6 having removable wafer holding plates 1, a wafer 2 is transferred not on the boat but with a preset part 8 comprising a fixed block 9 and fixed pin 10. The wafer is pushed up by the pin 10 only when the hold plate 1 is put on the block 9 to form a gap for inserting a transfer fork 3 between the wafer 2 and holding plates 1. The fork 3 is inserted here to lift the wafer 2 and carry it between the preset part 8 and carrier 11. For carrying it between the boat 6 and preset part 8, the plates 1 is lifted by the fork 3. |
