| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate holder for film deposition by sputtering, causing no fluctuation in sputter voltage in depositing a prescribed film onto a glass substrate by sputtering, and a method of fabrication for photomask blanks using it. SOLUTION: A substrate holder 10 consists of a frame part 11 composed of metal, etc., and a part 12 for mounting a glass substrate thereon. A dummy part 13 of prescribed size, composed of glass with the same material quality as the glass substrate, is provided to the frame part 11.</p> |
