ABRASIVE MATERIAL AND ABRASION PROCESS

摘要

PROBLEM TO BE SOLVED: To provide a novel abrasive material for the abrasion of glass, quartz bases, ceramic bases, semiconductor bases, bases for memory hard disks, semiconductor devices, etc., which exerts a high abrasion rate and evenness and generates little surface defects such as scratches, etc. SOLUTION: An abrasive material comprises an oxide of the formula: ABO3, wherein the average particle size is <=2μm and the maximum particle size is 4 time as large as the average particle size or smaller.