METHOD FOR MAKING INTEGRATED CIRCUITS INCLUDING FEATURES WITH RELATIVELY SMALL CRITICAL DIMENSION

摘要

PURPOSE: A method for making integrated circuits including features with a relatively small critical dimension is provided to achieve the integrated circuits with smaller feature sizes, based upon the overlap or shifted exposure approach and while accurately producing the small circuit features. CONSTITUTION: The system includes an optical source(12) which generates light directed toward and through the illustrated reticle(14). The reticle(14) includes pattern features thereon which will be optically transferred to the surface of the semiconductor wafer(15) as will be readily appreciated by those skilled in the art. A lens system(16) is schematically illustrated in the optical path from the reticle(14) to the wafer(15).