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发明名称
APPARATUS AND METHOD FOR DETERMINING DEPTH PROFILE CHARACTERISTICS OF A DOPANT MATERIAL IN A SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20010032343(A)
申请公布日期
2001.04.16
申请号
KR1020007005569
申请日期
2000.05.22
申请人
发明人
分类号
H01L21/66
主分类号
H01L21/66
代理机构
代理人
主权项
地址
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