| 摘要 |
PURPOSE: To provide a plasma processing device which is excellent in maintainability, long in service life as a whole, and capable of restraining an abnormal discharge from occurring in a gate space. CONSTITUTION: A plasma processing device is composed of a chamber 1 which can be kept in vacuum and treats a work with plasma, an exhaust mechanism 26 which exhausts the chamber 1, a gas introduction mechanism 20 which introduces processing gas into the chamber 1, a plasma generating means 2, 16, and 11, a chamber gate 22 which is provided to the side wall of the chamber 1 so as to load or unload a work W into or from the chamber 1, and a gate liner 24 of metal or ceramic provided in a detachable manner covering the inner wall of the chamber gate 22.
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