| 摘要 |
<p>PURPOSE: To provide a manufacturing environment 110 for a wafer fabrication processing and an SPC environment 112 for setting control limits and acquiring data for production runs. CONSTITUTION: A computation environment 114 processes SPC data, and the SPC data is analyzed in an analysis environment 116. An EMS environment 118 evaluates the analysis and automatically executes a process intervention, if the process lies outside the control limits. In addition, this technique provides for an electrical power management system, a spare parts inventory, and a scheduling system, and a wafer fabrication process system. These systems employ algorithms 735, 1135, and 1335.</p> |
