发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: To provide a resistance element having a high resistance accuracy, resistant to coupling noises from adjacent wirings and superior in substrate follow-up property. CONSTITUTION: The device has a resistance element 6 formed on a resistance element forming region 17 of a Si substrate 1, using a wiring layer 20 formed at the same time as forming a gate electrode 12 of a MOS type transistor 22 constituting a memory cell in a transistor forming region 18 of the substrate 1 when forming the resistance element 6.
申请公布号 KR20010030368(A) 申请公布日期 2001.04.16
申请号 KR20000053815 申请日期 2000.09.09
申请人 NEC CORPORATION 发明人 OTA KEN
分类号 H01L27/04;H01L21/822;H01L21/8242;H01L23/522;H01L27/02;H01L27/06;H01L27/108;(IPC1-7):H01L27/02 主分类号 H01L27/04
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