| 摘要 |
<p>PURPOSE: To provide a manufacturing environment (110) for a wafer fabrication and an SPC environment (112) for setting control limits and acquiring metrology data of production run. CONSTITUTION: A calculation environment (114) processes SPC data and the SPC data is analyzed under a analysis environment (116). An MES environment (118) evaluates the analysis and automatically executes a process invention when the process is outside the control limits. In addition, the present invention provides for an electrical power management system, a spare parts inventory and scheduling system and a wafer fabrication efficiency system. These systems employ algorithms.</p> |
