发明名称 COPPER CHLORIDE ETCHING SOLUTION ELECTROLYTIC REGENERATION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an improvement type electrolytic regeneration treatment system by which the precipitating state of copper powder is fixed, and the scraping-off of the copper powder from a cathode plate and the exhaust of the copper powder from a cathode chamber can stably be executed. SOLUTION: A solution return path from an electrolytic cell 2 to an etching cell 1 is arranged with a return solution cell 4, a solution exhausted from an anode chamber is temporarily retained in the return solution cell, moreover, a cathode chamber 23 of the electrolytic cell is provided with a solution face level detecting means 16, based on the detected result from the solution face level detecting means, a part of the solution retained in the return solution cell is returned to the cathode chamber, and the solution face level of the cathode chamber is controlled to a fixed range.
申请公布号 JP2001107270(A) 申请公布日期 2001.04.17
申请号 JP19990280011 申请日期 1999.09.30
申请人 NITTETSU MINING CO LTD 发明人 IORIZAKI MASAAKI;ORIGASA MINORU;TAKAYAMA SUSUMU
分类号 C23F1/46;C23F1/18;(IPC1-7):C23F1/46 主分类号 C23F1/46
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