发明名称 FABRICATION OF METAL PARTICLE FOR ANISOTROPIC CONDUCTIVE FILM, AND METAL PARTICLE FOR ANISOTROPIC CONDUCTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a method of fabricating metal particles for anisotropic conductive film, having high hardness, minimal contact failure uniform shape and usable as an alternative to the conventional conductive particles prepared by applying Au plating to resin particles, and the metal particles for anisotropic conductive film. SOLUTION: The method for fabricating the metal particles for anisotropic conductive film comprises steps of: forming a resinoid resist film on a substrate; providing micropores to the resist film; applying plating composed essentially of metal consisting of any of Ni, Cu, Ag and Au to the micropores; melting and removing the above resist; and peeling off the resultant metal plating particles composed essentially of metal consisting any of Ni, Cu, Ag and Au from the above substrate to obtain the metal particles for anisotropic conductive film.
申请公布号 JP2001107110(A) 申请公布日期 2001.04.17
申请号 JP20000236417 申请日期 2000.08.04
申请人 HITACHI METALS LTD 发明人 SATO KOJI;INOUE RYOJI;KAGEYAMA KAGEHIRO
分类号 B22F9/02;H01B5/00;H01B13/00;(IPC1-7):B22F9/02 主分类号 B22F9/02
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