| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for development processing, which can perform satisfactory development by solving various problems arising, when a developer is applied onto a wafer. SOLUTION: This development processor which supplies a developer to a wafer W, having a photoresist film exposed to a pattern to develop the pattern forming region of the photoresist film and has a wafer-holding part 3 which holds the wafer nearly horizontally, a developer supply unit 4 which supplies developer to the entire surface of the wafer W to cover the pattern-formed region with a film of the developer, and a far-infrared heater6 which controls the progression of the development by heating the developer supplied onto the wafer W. |
