发明名称 SURFACE WORKING METHOD FOR SUBSTRATE FOR MAGNETIC DISK
摘要 PROBLEM TO BE SOLVED: To finish the surface of a substrate for a magnetic disk so as to have smooth and uniform roughness. SOLUTION: An aqueous acidic solution of a pH below 4 is used as an electrolyte in the surface working method for the substrate for the magnetic disk which simultaneously executes the electrolytic treatment of the substrate surface and the friction cleaning treatment by a cleaning material by rotating the substrate for the magnetic disk having a conductive layer on the surface, electrically conducting an electrode installed to face the substrate and the substrate to each other with the electrolyte, applying voltage between both in this state and bringing the cleaning material into contact with the substrate in this state.
申请公布号 JP2001101653(A) 申请公布日期 2001.04.13
申请号 JP19990273977 申请日期 1999.09.28
申请人 MITSUBISHI CHEMICALS CORP 发明人 SHIGERU TOMOO;MAKABE YASUSHI;KAYANO MICHIAKI;FUKUTANI MASANORI
分类号 G11B5/84;C25F1/04;(IPC1-7):G11B5/84 主分类号 G11B5/84
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